Structured line patterns find a great deal of application in the field of microelectronics and optoelectronic
devices. In this communication, a new method for the deposition of the periodic structured patterns with nanosecond
pulsed laser interference together with Laser Induced Forward Transfer (LIFT) has been presented. Laser Induced
Forward Transfer is a simple direct write technique to micro pattern a surface by localized deposition of material. Patterns
transferred were evaluated with the help of optical microscopy and atomic force microscopy images. The main advantage
of this method is that we can modify the pattern dimensions by simple changes in the optical setup.