Table 2: Effect of sputtering on “CCR” at λ=10.6 µm.

Mirror Samples R before Ion Bombardment R after Ion Bombardment
Single Mirror “Retro-Reflector” Single Mirror “Retro-Reflector”
O-free copper 97% 91% 87% 66%
CuCr 96% 90% 42% 7.3%