Table 2:
Effect of sputtering on “CCR” at λ=10.6 µm.
Mirror Samples
R before Ion Bombardment
R after Ion Bombardment
Single Mirror
“Retro-Reflector”
Single Mirror
“Retro-Reflector”
O-free copper
97%
91%
87%
66%
CuCr
96%
90%
42%
7.3%