Table 3: Sputtering of mirror samples in the TS.

Mirror Material Average Roughness
Ra, nm
Sputtering Depth, µm Sputtering Depth in Relation to the Sputtering Depth of the Mo Sample
Before After Measured Data
Y/Y(Mo)
Computed Results Y/Y(Mo)*
Mo 0.5 0.7 0.12 1.0 1.0
SS 1.6 5.7 0.22 1.8 6.9
Cu 7.0 47 2.68 22.3 15.5

*Computed using the data from report [52] with due regard for the experimental conditions during the whole experimental running period, and also, with the use of the sputtering data from [5].