Table 3: Sputtering of mirror samples in the TS.

Mirror Material Average Roughness
Ra, nm
Sputtering Depth, ┬Ám Sputtering Depth in Relation to the Sputtering Depth of the Mo Sample
Before After Measured Data
Y/Y(Mo)
Computed Results Y/Y(Mo)*
Mo 0.5 0.7 0.12 1.0 1.0
SS 1.6 5.7 0.22 1.8 6.9
Cu 7.0 47 2.68 22.3 15.5

*Computed using the data from report [52] with due regard for the experimental conditions during the whole experimental running period, and also, with the use of the sputtering data from [5].