Indium sulfide thin films were prepared using a relatively new, simple and inexpensive technique called Successive Ionic Layer Adsorption and Reaction (SILAR). SILAR deposition conditions for obtaining good quality β-Indium sulfide (In₂S₃) films were optimized. The films were structurally and optically characterized using X-ray diffraction (XRD), photosensitivity measurements and optical absorption studies. Effects of using different precursor solutions, indium chloride (InCl3) and indium nitrate (In(NO3)3) and post deposition annealing were also studied. Films fabricated with In(NO3)3 showed good crystallinity without any post deposition annealing while films prepared using InCl3 were crystalline only when annealed at 4000C. The band gap of the films varied from 2.32 to 2.92 eV depending on the deposition conditions